FF-1000 - Automatic Spectroscopic Ellipsometer - Spectral range: 190 - 830 nm
Advanced Thin Film Metrology Platform for Display Technology
- Highest accuracy for display applications
- Up to 5th flat panel display substrate
- Advanced automation features
- Optional spectroscopic reflectometer
- Integrated software platform
The FF-1000 automatic spectroscopic ellipsometer was specifically designed for the display industry and is able to handle up to 5th generation glass substrate.
The FF-1000 allows accurate and fast characterization of thickness, optical constants and uniformity for advanced display device applications. It also supports production processes for next generation FPDs such as low-temperature polysilicon in TFT (Thin Film Transistors) and organic EL (Organic Electro Luminescence) processes.
The phase modulated technology is the most suitable for accurate thin film measurement on transparent substrates as the software includes advanced capabilities for automatic correction of backside reflections.
The FF-1000 automatic spectroscopic ellipsometer is highly featured including: precision motorized stage, robust pattern recognition software, and optional spectroscopic reflectometer.
|
Characterization of thickness, optical constants of thin films and film stacks for: |
|
Characterization of complex material properties: |
